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In Situ Formation of Ink Jet Nozzle Protective Coatings

IP.com Disclosure Number: IPCOM000083822D
Original Publication Date: 1975-Jul-01
Included in the Prior Art Database: 2005-Mar-01
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Aboaf, J: AUTHOR [+4]

Abstract

Ink jet nozzle technology based on Si offers considerable promise. However, because of corrosion and erosion tendencies of electrostatic and magnetic inks, respectively, the lifetime of Si nozzles may not be adequate from a reliability standpoint. SiO(2) has been employed as a protective coating but does not appear to represent a complete solution to the problem. It has been proposed that various types of other coatings plus geometrical rounding of sharp edges in nozzle fabrication would further alleviate the reliability exposure.

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In Situ Formation of Ink Jet Nozzle Protective Coatings

Ink jet nozzle technology based on Si offers considerable promise. However, because of corrosion and erosion tendencies of electrostatic and magnetic inks, respectively, the lifetime of Si nozzles may not be adequate from a reliability standpoint. SiO(2) has been employed as a protective coating but does not appear to represent a complete solution to the problem. It has been proposed that various types of other coatings plus geometrical rounding of sharp edges in nozzle fabrication would further alleviate the reliability exposure.

One problem with deposited thin films is their susceptibility to imperfections. Such susceptibility coupled with adhesion and thermal mismatch differences, lead to the conclusion that it would be very difficult to provide a highly reliable thin passivating coating by any film deposition technique, where the substrate itself does not participate in the formation of passivating film.

Methods for the for ation of coatings which cause the substrate to participate in the formation of passivating films, thereby improving the integrity of the films formed upon and within them are shown hereafter. Method 1 - Formation of carbide coatings. a) SiC.

The nozzle structure is oxidized to a depth of about 1 mu m by conventional procedures. The oxidized structure is then placed in a chemical vapor deposition (CVD) reactor and subjected at elevated temperatures to organic compound such as acetylene...