Browse Prior Art Database

Azeotropic Mixtures for Resist Development

IP.com Disclosure Number: IPCOM000083877D
Original Publication Date: 1975-Aug-01
Included in the Prior Art Database: 2005-Mar-01
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Chiu, GT: AUTHOR [+2]

Abstract

Azeotropic developer systems are employed in developing resist layers to form a relief image of resist on a substrate. The azeotropic mixtures do not stain or redeposit dissolved resist, when the developed layer is being dried to remove residual resist materials. Therefore, the previously required step of rinsing or acid etching to remove redeposited resist scum from the surface of the substrate is eliminated.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Azeotropic Mixtures for Resist Development

Azeotropic developer systems are employed in developing resist layers to form a relief image of resist on a substrate. The azeotropic mixtures do not stain or redeposit dissolved resist, when the developed layer is being dried to remove residual resist materials. Therefore, the previously required step of rinsing or acid etching to remove redeposited resist scum from the surface of the substrate is eliminated.

According to the process, radiation sensitive resist materials such as vinyl polymers - for example: polymethyl methacrylate, poly tertbutyl methacrylate, polymethyl methacrylate-methacrylic acid copolymers, polysulfones, polycarbonates, or copolymers and terpolymers of the above with elastomers and aliphatic and aromatic compounds containing double bonds, are coated on the surface of the substrate and subjected to high-energy radiations, such as by a scanning electron beam.

Following pattern-wise exposure of the resist layers, the exposed portions of the layer are removed by contact with aqueous or nonaqueous solvents which are present in the mixture in the proportions which are needed to produce an azeotropic mixture of these solvents. Suitable mixtures include, for example, methyl CELLOSOLVE* and meta-xylene in a 58/42 ratio in parts by weight. Other suitable azeotropic mixtures are listed below:

(Image Omitted)

* Trademark of Union Carbide Corporation.

1