Browse Prior Art Database

Angle of Incidence Monitor

IP.com Disclosure Number: IPCOM000083888D
Original Publication Date: 1975-Aug-01
Included in the Prior Art Database: 2005-Mar-01
Document File: 2 page(s) / 35K

Publishing Venue

IBM

Related People

Dahlke, GP: AUTHOR [+3]

Abstract

In vacuum deposition of thin films, the vapor stream's angle of incidence is critical and especially so when evaporating onto a substrate that has an underlay stencil.

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Angle of Incidence Monitor

In vacuum deposition of thin films, the vapor stream's angle of incidence is critical and especially so when evaporating onto a substrate that has an underlay stencil.

Shown is an angle of incidence monitor that uses an E-gun source which is unique, because the virtual source height can vary with the deposition rate.

A wafer substrate 4 is mounted in the angle of incidence monitor. The monitor is mounted in an evaporator, which is perpendicular to the virtual source
6. The image is deposited through the orifice plate 8. The monitor is then placed in any position on the wafer dome 10 and deposition is performed.

By measuring the delta of the two images and knowing the dimensions of spacer 12, the angle of incidence can be calculated.

The molecular flow is shown at 90 degrees (14) and 80 degrees (16).

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