Browse Prior Art Database

Mask Design for Complex Pattern Paste Application

IP.com Disclosure Number: IPCOM000084048D
Original Publication Date: 1975-Sep-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Byrne, TO: AUTHOR

Abstract

Described is a technique for utilizing nonmesh masks for utilization with paste deposition of complex patterns.

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Mask Design for Complex Pattern Paste Application

Described is a technique for utilizing nonmesh masks for utilization with paste deposition of complex patterns.

Screening methods similar to the silk screen technique have long been used to form circuits by depositing a paste through the screen stencil, to form a conductive pattern on ceramic or glass base materials. With increased circuit complexity, it has been found that such silk screening methods will not suffice to provide thin narrow lines such as, for example, four mils wide on eight mil centers, because of the size limitations of the wires needed in such meshes to support the arrangement

To overcome the difficulty of producing such elements to close tolerances and to increase the probability of avoiding discontinuities in the elements during their production, the masks are now made from a thin sheet of molybdenum with a suitable pattern etched through the mask.

To reinforce and strengthen the mask, tabs or openings in the circui pattern are strategically located for support, thus eliminating the need for the mesh. The tabs may vary in size to provide sufficient strength to maintain mask integrity. A second mask is needed to complete the circuit pattern on a subsequent pass.

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