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Eliminating Interference Exposure in Proximity Printing

IP.com Disclosure Number: IPCOM000084053D
Original Publication Date: 1975-Sep-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 25K

Publishing Venue

IBM

Related People

Renken, HH: AUTHOR [+2]

Abstract

Described is a durable mask for proximity projection printing, in which a transparent body has a partially transparent mirror deposited on one side and on the opposite side has an opaque mask which, in turn, is coated with a quartz coating and an antireflective layer.

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Eliminating Interference Exposure in Proximity Printing

Described is a durable mask for proximity projection printing, in which a transparent body has a partially transparent mirror deposited on one side and on the opposite side has an opaque mask which, in turn, is coated with a quartz coating and an antireflective layer.

As shown, a glass body 10 has deposited thereon a chromium pattern 11 which is in the form of a mask for optical masking techniques. On the surface opposite to this chromium pattern is deposited a semitransparent partially reflecting layer 12 of material, such as gold or chromium. Such semitransparent partially reflecting layers 12 are well known to the art.

Overcoating the mask pattern 11 is a layer of evaporated or sputtered quartz 13, upon which there is deposited an antireflective layer 14. This antireflective layer 14 eliminates interference exposure in the proximity printing, and improves the masks lifetime and resolution for proximity printing, because the gap between the mask and the wafer can be made wide enough to insure a no contact condition between 25 and 50 micrometers.

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