Browse Prior Art Database

Silicon Wafer Cleaning With High Purity Felt

IP.com Disclosure Number: IPCOM000084064D
Original Publication Date: 1975-Sep-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 36K

Publishing Venue

IBM

Related People

Gardner, JK: AUTHOR

Abstract

One problem during wafer cleaning is to remove all particulate matter from wafer products without scratching the wafer surfaces.

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Silicon Wafer Cleaning With High Purity Felt

One problem during wafer cleaning is to remove all particulate matter from wafer products without scratching the wafer surfaces.

The figure shows clamp 2, holding the brush/felt holder 4, in a prefixed condition. This condition sets the angle and pressure of the felt 8, that is best suited for the cleaning of the wafer surface. Clamp 2 makes for easy replacement of the felt 8 around the brush 14, when necessary, without disturbing the angle/pressure relationship.

Functionally, a wafer is placed on the pedestal 12 and moved under the felt 8 position. The wafer on the pedestal 12 is then rotated under the felt 8, saturated with a solution of ten percent methol alcohol and ninety percent DI water, and wiped clean.

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