Browse Prior Art Database

Semiconductor Processing Tube Pressure Control

IP.com Disclosure Number: IPCOM000084422D
Original Publication Date: 1975-Nov-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 38K

Publishing Venue

IBM

Related People

Quinn, RM: AUTHOR

Abstract

Continuous semiconductor processing apparatus as taught in United States Patent No. 3,790,404 may exhibit pressure fluctuations in the process zone. This is believed to be caused by high-velocity exhaust gas.

This text was extracted from a PDF file.
At least one non-text object (such as an image or picture) has been suppressed.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 2

Semiconductor Processing Tube Pressure Control

Continuous semiconductor processing apparatus as taught in United States Patent No. 3,790,404 may exhibit pressure fluctuations in the process zone. This is believed to be caused by high-velocity exhaust gas.

The design illustrated tends to eliminate that condition by producing a pressure drop across a small orifice at the exhaust opening. Referring to the drawing, a continuous processing tube 1 has a quartz carrier plate 2 with a semiconductor wafer thereon passing through the tube. The tube 1 has exhaust ports 3 of reduced cross section which provide an even exhaust gas flow and eliminates a complicated and intricate baffle arrangement, except zone definition baffles 4. The particular design is less complicated and much easier to fabricate.

1

Page 2 of 2

2

[This page contains 3 pictures or other non-text objects]