Browse Prior Art Database

Wafer Chuck Air Flow

IP.com Disclosure Number: IPCOM000084477D
Original Publication Date: 1975-Nov-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 59K

Publishing Venue

IBM

Related People

Gruber, LW: AUTHOR [+2]

Abstract

This air track system is designed to transfer wafers in and out of a wafer orientor and chucking station. Shown is a porting system for air flow, which is a sandwich of drilled plates, plus a centering air feature, which consists of ports facing at right angles to the center. Also, the track is bidirectional along the same axis, one wafer at a time.

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Wafer Chuck Air Flow

This air track system is designed to transfer wafers in and out of a wafer orientor and chucking station. Shown is a porting system for air flow, which is a sandwich of drilled plates, plus a centering air feature, which consists of ports facing at right angles to the center. Also, the track is bidirectional along the same axis, one wafer at a time.

The three wafer mounting surfaces are dual ported for vacuum hold-down and an air vector (45 degrees) to direct the wafer toward the orienting drive wheel. The drive wheel rotates the wafer until the wafer notch fits into the locator pin. A sensor, located along the direction of motion, signals the wafer arrival or departure.

Fig. 1 shows a wafer 5 moving on a wafer chuck 6 with track air 1 (wafer moving in), track air 2 (wafer moving out), 45 degree directional air 3 with the wafer edge preloaded for notch detection and rotation by notch detector locator pin 7, and constant flow centering air 4. The vacuum ports 8 and wafer in-out sensor 9 are also shown.

Fig. 2 shows a wafer line connected by holes that are ported through wafer chuck base 10, into a wafer manifold mounting plate 11, whose one outer edge is adaptable for a pneumatic line connector 12. Air flows through track manifold plate 13.

Fig. 3 is a top view of a stationary wafer mounting surface 14 with the 45 degree directional air 3. Fig. 4 is a cross section of a stationary wafer mounting surface 14.

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