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Browse Prior Art Database

Photo Machine Dual Lighting System

IP.com Disclosure Number: IPCOM000084612D
Original Publication Date: 1975-Dec-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 17K

Publishing Venue

IBM

Related People

Bouchard, DR: AUTHOR [+3]

Abstract

Phototracing machines selectively expose patterns on photosensitive material. Most of the phototracing machines presently in use utilize a light spot which is moved relative to the material which is being exposed, thereby tracing a pattern on this material.

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Photo Machine Dual Lighting System

Phototracing machines selectively expose patterns on photosensitive material. Most of the phototracing machines presently in use utilize a light spot which is moved relative to the material which is being exposed, thereby tracing a pattern on this material.

It is also possible to expose the photosensitive material by utilizing a flash- on-the-fly system. In such a system, the light source is rapidly flashed as the photosensitive material is moved relative to the light source. For example, if a pattern that includes a series of circular areas is to be exposed, a mask or aperture having a round hole is introduced between the light source and the photosensitive material. The light is flashed each time this mask is aligned with a spot where it is desired to expose a circular area.

The light source must provide sufficient energy during its flash to appropriately expose the photosensitive material. The relative motion between the light source and the photosensitive material can be continuous, and the light can be flashed at appropriate times to give the desired pattern.

If it is desired to expose a continuous line utilizing the flash-on-the-fly technique, an aperture can be used having a shape such as that described by the solid line shown above. The flash exposures should be overlapped as indicated by the dotted line. In this way, the only area of the line which receives a double exposure is the central portion of the line where the...