Browse Prior Art Database

Tool for Blanket Exposure of Photopolymer Films

IP.com Disclosure Number: IPCOM000084625D
Original Publication Date: 1975-Dec-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 42K

Publishing Venue

IBM

Related People

Kulak, JE: AUTHOR [+2]

Abstract

Semiconductor wafers are transported via an air track under two light sources sequentially where they are exposed to ultraviolet radiation. Each wafer is fully exposed uniformly for the first half of the cycle under one lamp and for the second half of the cycle under the second lamp. Cycle time is adjustable.

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Tool for Blanket Exposure of Photopolymer Films

Semiconductor wafers are transported via an air track under two light sources sequentially where they are exposed to ultraviolet radiation. Each wafer is fully exposed uniformly for the first half of the cycle under one lamp and for the second half of the cycle under the second lamp. Cycle time is adjustable.

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