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Measuring the Thickness and Distance of Thin Layers

IP.com Disclosure Number: IPCOM000084635D
Original Publication Date: 1975-Dec-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 25K

Publishing Venue

IBM

Related People

Bohg, A: AUTHOR

Abstract

Electron beam 1 of an electron microscope is focused on a small spot and directed on the aligned transparent probe 2. During this process, contamination mounds serving as marks 3 are produced on opposite sides of probe 2 by remnants of gas. These marks 3 can also be produced by reaction of the E-beam with a coating on both sides of probe 2.

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Measuring the Thickness and Distance of Thin Layers

Electron beam 1 of an electron microscope is focused on a small spot and directed on the aligned transparent probe 2. During this process, contamination mounds serving as marks 3 are produced on opposite sides of probe 2 by remnants of gas. These marks 3 can also be produced by reaction of the E- beam with a coating on both sides of probe 2.

Then probe 2 is rotated through an angle or is observed from direction 4, whereby marks 3, which were originally exactly congruent, are shifted by x in relation to each other. By measuring- and x, thickness t of probe 2 can be computed from t = x/sin . The distance between two layers can be determined in a similar manner.

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