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Ferromagnetic Thin Film from Nonmagnetic Sources

IP.com Disclosure Number: IPCOM000084690D
Original Publication Date: 1975-Dec-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Condas, GA: AUTHOR [+2]

Abstract

Thin ferromagnetic films for device applications can be deposited through vacuum deposition such as resistance heated sources, electron bombardment heated sources, or sputtering.

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Ferromagnetic Thin Film from Nonmagnetic Sources

Thin ferromagnetic films for device applications can be deposited through vacuum deposition such as resistance heated sources, electron bombardment heated sources, or sputtering.

In many instances nonmagnetic sources may be required, to avoid interaction with magnetic fields that may be needed to form desired parameters in the film or to assist in the deposition process.

Minimization of the permeability can be attained for such a source by several methods: 1. Keeping the source material heated above its Curie temperature. 2. The source can be treated by a small addition of elements to accomplish a phase change with or without a special energy treatment. These small quantities will have minimal effect on the magnetic properties of the resulting films. 3. A source can be composed of several nonmagnetic alloys, such that the deposited film is the proper composition for the required magnetic properties. 4. Deposition with two or more locally separated sources, each of which is a nonmagnetic alloy.

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