Browse Prior Art Database

Resistivity Measurement System for Open Rinse Tanks

IP.com Disclosure Number: IPCOM000084744D
Original Publication Date: 1975-Oct-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 33K

Publishing Venue

IBM

Related People

Hoeg, AJ: AUTHOR [+3]

Abstract

Shown is a resistivity measurement system for open rinse tanks in single wafer semiconductor processing.

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Resistivity Measurement System for Open Rinse Tanks

Shown is a resistivity measurement system for open rinse tanks in single wafer semiconductor processing.

The system comprises a rinse tank with a rinse water inlet at the bottom and two rinse water outlets at the top with differential heights below the rinse water level.

One of the outlets specified as "overflow" in the drawing is higher than the other outlet specified as "underflow". The overflow acts as a skimmer to remove surface and environmental gas contaminants which could cause erroneous resistivity measurements. Thus, the outlet rinse water from the underflow outlet is a true representation of the outlet rinse water, and resistivity measurement is made on the underflow rinse water.

This measurement system eliminates false rinse water resistivity readings in open rinse tanks.

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