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IP.com Disclosure Number: IPCOM000084797D
Original Publication Date: 1976-Jan-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 3 page(s) / 49K

Publishing Venue

IBM

Related People

Censak, RJ: AUTHOR [+3]

Abstract

The present spin-etch technology for processing silicon wafers requires that the top surface of the wafer be exposed during chemical etching. Other chemical processes and end-point determinations require that both surfaces of the wafer be accessible. Temperature control of the environment of the process is also critical. Previously, spin-type tools for processing wafers utilized a vacuum for holding the wafer to the spindle. Under such circumstances, access to the back side of the wafer was restricted and limited the use of the tool to certain processes.

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The present spin-etch technology for processing silicon wafers requires that the top surface of the wafer be exposed during chemical etching. Other chemical processes and end-point determinations require that both surfaces of the wafer be accessible. Temperature control of the environment of the process is also critical. Previously, spin-type tools for processing wafers utilized a vacuum for holding the wafer to the spindle. Under such circumstances, access to the back side of the wafer was restricted and limited the use of the tool to certain processes.

The present device eliminates these problems by providing a spinning support for the silicon wafers, which provides access to both the front and the back of the wafer for chemical etching and test purposes. The wafer is supported in a relatively constant-temperature environment during the spinning operation and is held in place by centrifugal latches, which provide an automatic centering effect and reduce the amount of mechanical parts to a minimum.

Referring to Fig. 1, a yoke 1, in the form of an inverted Y shape, is provided, which runs in a bearing 3 on a vertical axis driven by a motor 5 as shown, so that with motor 5 in operation, the yoke 1 will be rotated at a suitable speed. The motor 5, the spindle and the bearing 3 are fastened to the lid 7 of a housing 9 which is double walled and is filled with fluid and controlled to provide a suitable temperature in the interior space, so that the space 11 is utilized in the nature of a constant-temperature bath, thereby rendering the interior 13 of the total chamber relatively constant in temperature.

Various access ports and doors can be provided in the walls and top 7 of the chamber 9, which are not shown in the drawing for sake of simplicity. At the lower end of the yoke 1, a support plate 15 is provided, having a cutout center portion, as can be more easily seen i...