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Method for particle prevention in a removable pellicle system

IP.com Disclosure Number: IPCOM000084999D
Publication Date: 2005-Mar-02
Document File: 2 page(s) / 193K

Publishing Venue

The IP.com Prior Art Database

Abstract

Disclosed is a method for particle prevention in a removable pellicle system. Benefits include improved functionality and improved performance.

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Method for particle prevention in a removable pellicle system

Disclosed is a method for particle prevention in a removable pellicle system. Benefits include improved functionality and improved performance.

Background

              Conventionally, when a removable pellicle is utilized in a reticle lithographic system, such as extreme ultraviolet lithography, particle impact can adversely affect the photomask quality. Particles are generated when the pellicle is detached from the reticle, the pellicle is attached to reticle, and the reticle and pellicle are transported in a carrier. The particles are electrostatically charged.

              A conventional reticle contact surface mechanically contacts the reticle but does not provide particle containment.

Description

              The disclosed method provides a particle containment function, using the reticle/pellicle mechanical holding function of a reticle carrier. An electrode (particle collector) surrounds the contact surface. Its electrostatic energy prevents generated particles from moving to the reticle where particles should not exist. The contact surface functions as the supply path of electrostatic energy to the electrodes (see Figure 1).

Advantages

      The disclosed method provides advantages, including:
•             Improved functionality due to providing particle prevention in a removable pellicle system
•             Improved performance due to preventing the generation of electrostatically charged particles that de...