Browse Prior Art Database

Contactless Planetary Motion

IP.com Disclosure Number: IPCOM000085014D
Original Publication Date: 1976-Feb-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 32K

Publishing Venue

IBM

Related People

Sauer, H: AUTHOR [+3]

Abstract

There is shown in Figs. 1 and 2 a pancake reactor utilizing a gas cushion to rotate a wafer in a planetary motion.

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Contactless Planetary Motion

There is shown in Figs. 1 and 2 a pancake reactor utilizing a gas cushion to rotate a wafer in a planetary motion.

The wafer 1 sits in a recess 2 on a graphite susceptor 3 which has holes 4 drilled in it for a gas, such as H(2), etc. This permits the wafer 1 to ride on a cushion of gas which will rotate the wafer, due to the angle of incidence of the gas to the wafer. With this level of rotation, only the graphite susceptor has to be rotated to obtain planetary motion as seen in Fig. 1. Fig. 2 shows a partial top view of Fig. 1.

This form of motion processing is, of course, extendable to all forms of hot processing equipment.

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