Browse Prior Art Database

Manual Programmable X Y Positioner

IP.com Disclosure Number: IPCOM000085020D
Original Publication Date: 1976-Feb-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Betts, RM: AUTHOR [+3]

Abstract

The apparatus consists of a base plate 1, a wafer or module orienting station 2, a template 3 and a pointer 4. The base plate is attached, for example, to the X-Y stage of a microscope being used to make measurements or samplings of semiconductor wafers 5. The system is adjusted so that the position of template 3 corresponds to the position of the optical axis on wafer 5. Base plate 1 is manually adjusted until pointer 4 is at the desired location on template 3, which corresponds to the part of wafer 5 it is desired to inspect. Because the patterns on the wafer object to be inspected may vary, template 3 can be changed to any desired pattern.

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Manual Programmable X Y Positioner

The apparatus consists of a base plate 1, a wafer or module orienting station 2, a template 3 and a pointer 4. The base plate is attached, for example, to the X-Y stage of a microscope being used to make measurements or samplings of semiconductor wafers 5. The system is adjusted so that the position of template 3 corresponds to the position of the optical axis on wafer 5. Base plate 1 is manually adjusted until pointer 4 is at the desired location on template 3, which corresponds to the part of wafer 5 it is desired to inspect. Because the patterns on the wafer object to be inspected may vary, template 3 can be changed to any desired pattern. By placing pointer 4 on the corresponding location of pattern 6 which it is desired to inspect on wafer 5, the microscope will be easily and rapidly located at the desired measurement point without need for the operator to look through the microscope.

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