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Browse Prior Art Database

Offset Registration Scheme

IP.com Disclosure Number: IPCOM000085154D
Original Publication Date: 1976-Feb-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 43K

Publishing Venue

IBM

Related People

Wardly, GA: AUTHOR

Abstract

A structure has been devised which is particularly useful for aligning a wafer to an X-ray lithographic mask to accuracies of about 0.1 micron, and enabling subsequent handling and parallel X-ray exposure of a multiplicity of such devices.

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Offset Registration Scheme

A structure has been devised which is particularly useful for aligning a wafer to an X-ray lithographic mask to accuracies of about 0.1 micron, and enabling subsequent handling and parallel X-ray exposure of a multiplicity of such devices.

The figure is a schematic representation of the aligning structure. The X-ray mask 2 is supported on a rigid holder 4, with the X-ray absorber pattern 6 facing away from a source of X-rays. An offset registration mask 8 is fixed to the X-ray mask holder 4 and is capable of being moved slightly away from or toward the mask by piezoelectric actuators 10 and 12. By applying electrical potentials to such actuators, the latter can move the offset registration mask 8 in the manner shown by the arrows 14. The offset registration mask 8 has opening 16 therein so that a focused beam 18 of light or electrons can pass through such openings. Reflected or scattered light or electrons are detected above the registration mask
8.

Initially, the X-ray mask 2 is fixed to a given registration position by sending the focused light 18 through an opening 16 to find the position of a registration mark 20 on the mask 2 relative to the opening 16. Such registration takes place with no object between light and mask. The mask 2 is locked in this relative position.

A wafer 22 is interposed between mask 2 and registration mask 8, the piezoelectric actuators 10 and 12 being energized, if needed, to seat the wafer 22 between the tw...