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Sputter Relief Etching of Magnetic Domains

IP.com Disclosure Number: IPCOM000085379D
Original Publication Date: 1976-Mar-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 2 page(s) / 28K

Publishing Venue

IBM

Related People

Gambino, RJ: AUTHOR [+2]

Abstract

A method for relief etching of magnetic domains of a magnetic film is provided using sputter etching of a decorated pattern on the film.

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Sputter Relief Etching of Magnetic Domains

A method for relief etching of magnetic domains of a magnetic film is provided using sputter etching of a decorated pattern on the film.

The figure shows a neutral substrate 2, such as silicon, on which is deposited a thin film 4 of magnetic material. In the body of film 4 are magnetic bubble domains 6 separated by domain walls 8. Adjacent bubbles have opposite magnetic polarities. A ferrofluid 12 is a suspension of magnetic particles, of the diameter of 50 Angstrom - 500 Angstrom, in water, kerosene or ethylene-glycol.

When such suspension fluid 12 wets the top surface of the magnetic film 4, magnetic particles 10 are attracted from the suspension by the domain walls & and form clusters near such walls. A stablizer, not shown, can be used to remove surfactants that surround each particle 10 so that the clusters are more strongly affixed to a wall region.

The excess ferrofluid 12 is removed by rinsing and evaporation, leaving the clusters 10 to serve as a mask. By keeping the magnetic film 4 at a negative potential of 1.5 K.V., the surface of the magnetic film is sputter etched in argon for thirty minutes. The etched regions (their depths are designated by dotted lines 14) are several hundred angstroms deep and the spacing between each etching can be as small as one micron.

The relief patterns that are created by the combination of magnetic domains decoration and sputter etching are useful in bubble propagation schemes,...