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Low Sputter Yield Cathode of W(3)Ru(2) for Gas Laser

IP.com Disclosure Number: IPCOM000085745D
Original Publication Date: 1976-May-01
Included in the Prior Art Database: 2005-Mar-02
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Borjarczuk, NA: AUTHOR [+2]

Abstract

It has been found that tungsten ruthenium (W(3)Ru(2)) used as a cathode in a gas laser results in an increased lifetime over the presently used aluminum cathodes.

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Low Sputter Yield Cathode of W(3)Ru(2) for Gas Laser

It has been found that tungsten ruthenium (W(3)Ru(2)) used as a cathode in a gas laser results in an increased lifetime over the presently used aluminum cathodes.

Corrosion studies to date indicate that W(3)Ru(2) has increased corrosion resistance to hostile acids and oxidation. It has a high-melting point, high-boiling point, and is very hard compared to aluminum and, therefore, provides a lower sputtering rate.

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