Browse Prior Art Database

Removal of Water From Perfluorohexanes

IP.com Disclosure Number: IPCOM000086276D
Original Publication Date: 1976-Aug-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Shields, RR: AUTHOR [+2]

Abstract

In this technique, water can be removed from perfluorohexane down to levels of 2ppm or less.

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Removal of Water From Perfluorohexanes

In this technique, water can be removed from perfluorohexane down to levels of 2ppm or less.

In liquid cooled semiconductor devices, a liquid, typically perfluorohexane, is enclosed in a chamber where it comes in contact with the semi-conductor devices. During operation, the heat from the device is removed by boiling and subsequent condensation of the vapors. Contaminants in the cooling fluid have a deteriorating influence on the device and the package metallurgy. Water when present in the cooling liquid in amounts greater than 7ppm may cause significant problems.

In this process, the perfluorohexane is placed into a closed chamber containing a dessicant, i.e., CaSO . Within a few hours, the water concentration in the perfluorohexane will decrease to less than 2ppm. In practice, the perfluorohexane is treated just prior to placing in the package. The system should be designed such that after removing the water from the coolant, the coolant will not be exposed to the outside atmosphere before introduction into the liquid cooled package. This process can be used to dry perfluorohexane that is to be reclaimed from the package, and in addition the process is amenable to use within the air space of the package itself.

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