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Browse Prior Art Database

Adhesion Promotion and Crack Prevention in Lift Off Processing

IP.com Disclosure Number: IPCOM000086436D
Original Publication Date: 1976-Sep-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 31K

Publishing Venue

IBM

Related People

Chiu, GT: AUTHOR [+2]

Abstract

A multilayer lift-off structure employs a polymer underlayer 2 coated on the surface of substrate 1. A layer 3 of a methylsiloxane resin is coated on top of underlayer 2 followed by a top image forming layer 4 of a polymeric resist.

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Adhesion Promotion and Crack Prevention in Lift Off Processing

A multilayer lift-off structure employs a polymer underlayer 2 coated on the surface of substrate 1. A layer 3 of a methylsiloxane resin is coated on top of underlayer 2 followed by a top image forming layer 4 of a polymeric resist.

The casting solvent for layer 4 must be carefully chosen or cracking, poor coating, and poor adhesion occurs. These problems are avoided by either treating the surface of the methysiloxane resin with an O(2) plasma ("ashing") at about 100 watts for one minute prior to coating the image forming layer 4 or by a chemical treatment in, for example, buffered HF.

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