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Vacuum System with Bypass for a Residual Gas Analyzer

IP.com Disclosure Number: IPCOM000086449D
Original Publication Date: 1976-Sep-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 28K

Publishing Venue

IBM

Related People

Dahlke, GP: AUTHOR [+3]

Abstract

Constant monitoring of the residual gas in a vacuum system is essential to guarantee product quality. Residual gas analyzer 1 is designed to operate under high vacuum and cannot be operated when the vacuum exceeds 5 x 10/-4/ torr.

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Vacuum System with Bypass for a Residual Gas Analyzer

Constant monitoring of the residual gas in a vacuum system is essential to guarantee product quality. Residual gas analyzer 1 is designed to operate under high vacuum and cannot be operated when the vacuum exceeds 5 x 10/-4/ torr.

During the sputter etch cycle, the vacuum is back-filled with argon to a pressure of 8 x 10/-3/ torr in upper chamber 2. Lower chamber 3 of the vacuum system is maintained at a pressure of less than 1 x 10/-7/ torr. Provision of bypass line 4 allows for differential pumping, which enables the residual gas analyzer to be less than 5 x 10/-4/ torr while sampling the gas from upper chamber 2 where the product is being sputter-etched.

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