Browse Prior Art Database

Mask Artwork Release Agent and Technique

IP.com Disclosure Number: IPCOM000086458D
Original Publication Date: 1976-Sep-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Stankus, JJ: AUTHOR

Abstract

In this technique, adherence between a resist on a substrate or metal mask and an emulsion type glass artwork is minimized or eliminated.

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Mask Artwork Release Agent and Technique

In this technique, adherence between a resist on a substrate or metal mask and an emulsion type glass artwork is minimized or eliminated.

In forming metal screening masks for forming screened patterns on multilayer ceramic green sheets, a resist layer is first deposited on the metal blank, exposed to a glass artwork, the resist and artwork separated, the resist developed and the metal blank etched. A major problem in the manufacture of such masks is the stickiness or adhesion between the resist and the glass artwork during and after exposure.

In this technique, a very thin coating, on the order of 100 to 500 angstroms, of stainless steel is deposited on the emulsion type artwork on the glass mask. At these thicknesses, the stainless steel is transparent. The emulsion type glass artwork is coated with this transparent layer of stainless steel by RF sputtering using a stainless steel target. The coating can be verified by measuring the electrical resistance across the eight-inch direction on the glass.

If desired, the stainless steel coating can be removed from the glass without deteriorating the emulsion circuitry pattern. The heavily coated part can be put through an etcher using ferric chloride. The stainless steel is removed without deleterious effects to the circuitry. However, a phenomenon was observed in that the stainless steel appears to remain on the circuitry, but etches away on the glass surfaces of the mask.

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