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Browse Prior Art Database

Transition Metal Carbonyl Sensitizers for X Ray Lithography

IP.com Disclosure Number: IPCOM000086667D
Original Publication Date: 1976-Oct-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Dolgov, I: AUTHOR [+4]

Abstract

The absorption characteristics of transition metals for X-rays substantially increase the sensitivity of polymethylmethacrylate (PMMA) and PMMA-like materials to X-rays.

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This is the abbreviated version, containing approximately 100% of the total text.

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Transition Metal Carbonyl Sensitizers for X Ray Lithography

The absorption characteristics of transition metals for X-rays substantially increase the sensitivity of polymethylmethacrylate (PMMA) and PMMA-like materials to X-rays.

For example, a mixed solution of manganese carhonyl (0.5 gms) with PMMA (10 gms) in chloroform (200 mils) is spun on a semiconductor to produce a film approximately 20,000 angstroms thick. The coated wafers are exposed to Al (8 angstroms) radiation at doses varying from approximately 0.05 to 1.0 joules/cm/2/.

These wafers are then developed in 1:4 3-heptanone/hexyl acetate at 40 degrees C for 5 minutes. Image formation and depth of development occur at a faster rate than with an unsensitized PMMA control. Resolution characteristics of the original polymer are retained.

Other carbonyls are expected to behave in the same way, possibly with a sensitivity which is a function of thermal stability. Comparable results are expected using copolymer and other free-radical-degrading polymer systems.

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