Browse Prior Art Database

Semiconductor Mask Defect Monitor

IP.com Disclosure Number: IPCOM000086677D
Original Publication Date: 1976-Oct-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Gunthert, RJ: AUTHOR

Abstract

Heretofore, defects in masks employed in semiconductor manufacture were determined by electrical tests of the resultant structures formed in and on product wafers.

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This is the abbreviated version, containing approximately 100% of the total text.

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Semiconductor Mask Defect Monitor

Heretofore, defects in masks employed in semiconductor manufacture were determined by electrical tests of the resultant structures formed in and on product wafers.

Defects can be more accurately measured directly from the mask by use of chrome masks with a defect-monitor pattern, which is placed chrome side up in an electrical test set-up where it can be probed and tested.

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