Browse Prior Art Database

Depolarizing and Profile Manipulating Conformable Contact Printer

IP.com Disclosure Number: IPCOM000086802D
Original Publication Date: 1976-Oct-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 24K

Publishing Venue

IBM

Related People

Lapadula, C: AUTHOR [+2]

Abstract

The profile of a photoresist image can be changed from the regular overcut configuration to an undercut configuration by rotating the mask-wafer assembly about an axis that is inclined with respect to the optical axis of the beam.

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Depolarizing and Profile Manipulating Conformable Contact Printer

The profile of a photoresist image can be changed from the regular overcut configuration to an undercut configuration by rotating the mask-wafer assembly about an axis that is inclined with respect to the optical axis of the beam.

Differences in images of mutually perpendicular lines are eliminated due to polarization of the illumination.

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