Browse Prior Art Database

Adherent Polyarylsulfone Lift Off Underlay

IP.com Disclosure Number: IPCOM000086879D
Original Publication Date: 1976-Nov-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Havas, J: AUTHOR [+3]

Abstract

Polyarylsulfones have been employed as underlayers for multilayer lift-off structures which include an underlayer, an intermediate barrier layer of a methylsiloxane resin, and an upper radiation patternable resist layer. One difficulty which is associated with the use of polyarylsulfone is poor adhesion to SiO(2) and Si(3)N(4).

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Adherent Polyarylsulfone Lift Off Underlay

Polyarylsulfones have been employed as underlayers for multilayer lift-off structures which include an underlayer, an intermediate barrier layer of a methylsiloxane resin, and an upper radiation patternable resist layer. One difficulty which is associated with the use of polyarylsulfone is poor adhesion to SiO(2) and Si(3)N(4).

Polyethersulfones have better adhesion but lower temperature stability The advantages of each type of sulfone can be preserved by either using the polyethersulfone as a thin adhesive film for the polyarylsulfone or by using the polyethersulfone as an additive to the polyarylsulfone in small concentrations of about 2% by weight.

1