Browse Prior Art Database

Semiconductor Wafer Chuck

IP.com Disclosure Number: IPCOM000087072D
Original Publication Date: 1976-Dec-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 57K

Publishing Venue

IBM

Related People

Gruber, LW: AUTHOR [+2]

Abstract

Shown is a wafer-positioning tool in which a wafer 5 is being transported by track-in air 1, and centered by fence-air 4 in proximity of air-bearing locator sleeve or pin 11, where vacuum stop 7 checks the wafer.

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Semiconductor Wafer Chuck

Shown is a wafer-positioning tool in which a wafer 5 is being transported by track-in air 1, and centered by fence-air 4 in proximity of air-bearing locator sleeve or pin 11, where vacuum stop 7 checks the wafer.

At the wafer-positioning platform area 3, there are three fluidic ports 12, 13 and 14 (Figs. 2 and 3). Port 14 controls directional air, port 12 provides vacuum/pressure bias, and port 13 is a cavity area to obtain the proper area differential within bias pressure parameters. This platform configuration insures proper "HOLD" and "RELEASE" states of the wafer in platform 3 areas upon entering and leaving.

In operation, the directional air 14 induces wafer 5 into rotary motion until wafer 8 position is attained at vacuum stop 9. This positions the wafer periphery at locator pin 11 and rotary drive 20. The wafer rotation brings the wafer notch into seating engagement with locator pin 11, after which centering rollers 15 position the wafer on the platform 3.

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