Browse Prior Art Database

Surface Photopolymerization of Methacrylic Anhydride and Dimethacrylimides

IP.com Disclosure Number: IPCOM000087172D
Original Publication Date: 1976-Dec-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 1 page(s) / 12K

Publishing Venue

IBM

Related People

Hiraoka, H: AUTHOR

Abstract

With methacrylic anhydride and dimethacrylimide, very thin polymer films with suitable structures for lithographic applications can be surface-photopolymerized from the gas phase on a substrate surface, such as a silicon wafer, with near ultraviolet (uv) light (Lambda> 3000 Angstroms) within a PYREX* glass vessel.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 79% of the total text.

Page 1 of 1

Surface Photopolymerization of Methacrylic Anhydride and Dimethacrylimides

With methacrylic anhydride and dimethacrylimide, very thin polymer films with suitable structures for lithographic applications can be surface- photopolymerized from the gas phase on a substrate surface, such as a silicon wafer, with near ultraviolet (uv) light (Lambda> 3000 Angstroms) within a PYREX* glass vessel.

A spin coating which has been used in the past for coating films on a silicon wafer cannot be applied for very thin films with thickness less than 3000 Angstroms because of unavoidable pin-hole formation. For organic film coating with less than 3000 Angstroms thickness, surface-photopolymerization on a substrate surface appears to be most suitable. This technique can provide extremely thin (200 to 1000 Angstroms) adherent films which are electrically and mechanically continuous. With the uv light of 254 nm, however, subsequent photodegradation of polymer films cannot be eliminated. Up to now, the reported photopolymerization technique always employs either the uv light and/or photosensitizers.

The present process of surface-photopolymerization of methacrylic anhydride or dimethacrylimides does not need any photosensitizers;, moreover, it requires only near uv light with Lambda> 3000 Angstroms within a PYREX glass ware, thus eliminating any further degradation of polymer films once formed on the substrate surface. This technique can be used in solution, but more advantageous appl...