Browse Prior Art Database

Polymeric Underlayer for Thin Films on Ferrite Substrates

IP.com Disclosure Number: IPCOM000087295D
Original Publication Date: 1977-Jan-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 34K

Publishing Venue

IBM

Related People

McCormick, W: AUTHOR [+3]

Abstract

Microscopic imperfections on polished substrates are replicated in thin films subsequently deposited on the substrate surface. A method is disclosed herein where the imperfections are minimized prior to depositing thin films.

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Polymeric Underlayer for Thin Films on Ferrite Substrates

Microscopic imperfections on polished substrates are replicated in thin films subsequently deposited on the substrate surface. A method is disclosed herein where the imperfections are minimized prior to depositing thin films.

The figure depicts an article manufactured from the disclosed process. After polishing the substrate, microscopic imperfections are alleviated by applying photoresist via a spin-coating technique. After cross linking the resist and evaporating thin ferromagnetic films on this substrate, the magneto-optical properties for those films are equal to those on thermally oxidized silicon wafers.

Photoresist offers the added advantage of shaping the spacer prior to cross linking by conventional photolithographic techniques. In some applications this could be of major advantage by avoiding chemical etching steps.

The above process is not limited to photoresist as an under-smoothing coat. For example, epoxy could also be used in the same manner. A possible extension of this technique could be the conversion of a polymeric undercoat to a glassy underlayer such as vitreous carbon. This would improve wear, machinability, and corrosion characteristics for head applications.

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