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Substrate Loading Technique

IP.com Disclosure Number: IPCOM000087304D
Original Publication Date: 1977-Jan-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 52K

Publishing Venue

IBM

Related People

Phinney, RR: AUTHOR

Abstract

This article describes a novel evaporation system that utilizes a mechanism whereby a number of products can be simultaneously treated during evaporation.

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Substrate Loading Technique

This article describes a novel evaporation system that utilizes a mechanism whereby a number of products can be simultaneously treated during evaporation.

The apparatus shown in Fig. 1 comprises a rectangular tank 10 parallel to a vacuum plenum 11 and separated into two side-by-side stations 10a and 10b by a gate valve 12. The product station 10a is always under vacuum. When wafers are in section 10a, they are in line with the evaporant stream. The adjacent loading/unloading station 10b can be sealed off from station 10a by the gate valve 12. The loading/ unloading station 10b of the chamber is provided with a trap door 13 so that it can be lifted by rotating it around its hinge with a rotary motor.

Pinion gears are provided on the inside of each station and synchronously driven by a motor driven chain 17 positioned outside the chamber. The pinion gears are arranged to engage a rack 18 situated on a sled 19 which carries a rotating multiple head gripper assembly 20, as shown in Fig. 2. The sled 19 is provided with an opening 21 through which the product can be loaded or unloaded from the individual gripper heads 22 on the assembly.

The gripper assembly 20 is suspended beneath the sled 19 on a coaxial shaft 23 (comprising outer shaft 23a and inner shaft 23b) which passes through the sled 19. The outer shaft 23a is provided with a toothed gear that engages a geneva mechanism mounted on the top of the loading/unloading station 10b so that...