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Browse Prior Art Database

Chemical and Wear Resistant Material

IP.com Disclosure Number: IPCOM000087347D
Original Publication Date: 1977-Jan-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Appolonia, MD: AUTHOR [+5]

Abstract

An insulating material, phosphorus oxynitride, which is easily deposited upon structures, is chemically inert to most solvents and abrasion resistant due to its hardness.

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Chemical and Wear Resistant Material

An insulating material, phosphorus oxynitride, which is easily deposited upon structures, is chemically inert to most solvents and abrasion resistant due to its hardness.

An example of its use is in photolithography. Photolithography plates or masks may be fabricated using metals such as chromium. Such metals degrade due to the abrasion and chemical cleaning of the intricate chromium pattern during normal use. The use of phosphorus oxynitride prevents such degrading of the chromium pattern. The material can be deposited onto the mask by chemical vapor deposition at temperatures as low as 400 Degrees C. Openings may be made in this material using reactive ion etching techniques.

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