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Registering and Correcting a Deflection Field in Electron Beam Microrecorders

IP.com Disclosure Number: IPCOM000087386D
Original Publication Date: 1977-Jan-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 28K

Publishing Venue

IBM

Related People

Engelke, H: AUTHOR

Abstract

During the manufacture of large-area integrated semiconductor circuits or discrete masks by an electronically deflected electron beam, time inconstancies, e.g., drift or pumping of the deflection field, must be taken care of. To this end the extension of the deflection field is registered by positioning marks. Fluctuations, if any, in the extension of the field are compensated by electronic field correction.

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Registering and Correcting a Deflection Field in Electron Beam Microrecorders

During the manufacture of large-area integrated semiconductor circuits or discrete masks by an electronically deflected electron beam, time inconstancies, e.g., drift or pumping of the deflection field, must be taken care of. To this end the extension of the deflection field is registered by positioning marks.

Fluctuations, if any, in the extension of the field are compensated by electronic field correction.

Positioning marks 1 are arranged on a registration diaphragm 2, which comprises an aperture 3, through which is passed electron beam 4 to a substrate
5.

Registration diaphragm 2 is permanently linked to the electron-beam unit 6 and arranged closely adjacent to substrate 5. Substrate 5 or the mask is arranged to be movable under the electron beam unit 6, e.g., on positioning table
7.

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