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Ion Beam Scanning by Magnetic Means

IP.com Disclosure Number: IPCOM000087545D
Original Publication Date: 1977-Feb-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 58K

Publishing Venue

IBM

Related People

Winnard, JR: AUTHOR

Abstract

In ion-implantation apparatus wherein the substrate, such as a semiconductor substrate, is bombarded with an ion beam directed at the substrate, scanning or deflection of the beam with respect to the substrate or vice versa has been traditionally carried out by either electrostatic or mechanical deflection means. The present structure provides some practical expedients for accomplishing such scanning by mechanical means which provide a uniform deposition of the charged particles across the target surface.

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Ion Beam Scanning by Magnetic Means

In ion-implantation apparatus wherein the substrate, such as a semiconductor substrate, is bombarded with an ion beam directed at the substrate, scanning or deflection of the beam with respect to the substrate or vice versa has been traditionally carried out by either electrostatic or mechanical deflection means. The present structure provides some practical expedients for accomplishing such scanning by mechanical means which provide a uniform deposition of the charged particles across the target surface.

The present apparatus utilizes a magnetic field (orthogonal to the ion beam) whose amplitude is time variant so that the ion beam velocity is constant at the target. The magnetic field is generated by a rotating mechanism which contains magnetic material or electromagnets. Coupling and uncoupling of magnetic circuits is accomplished by stationary mechanisms. The rotating mechanism consists of segments of magnetic and nonmagnetic material such that switching of the magnetic field occurs.

The drawings represent three diagrammatic variations of the present deflection structure. Fig. 1 displays the basic idea. The electrostatic deflection equivalent of this structure is the "push-pull" system in that the ion beam introduced into the vacuum gap is deflected an equal amount in both directions.

Fig. 2 displays one of the many alternative methods of the basic idea. As shown, a magnetic field is generated by a coil winding and DC power...