Original Publication Date: 1977-Mar-01
Included in the Prior Art Database: 2005-Mar-03
Clark, HA: AUTHOR [+2]
AbstractA wafer holder holds wafers back to back in intimate contact so that the back of each wafer is not attacked during glow-discharge gas etching.
A wafer holder holds wafers back to back in intimate contact so that the back of each wafer is not attacked during glow-discharge gas etching.
Holder 1 is made of aluminum or other material which is not attacked by the gas plasma. Sides 2 and 3 are joined to and arranged to pivot around a V- slotted bar 4 between an open position (Fig. 1) and a closed position (Fig. 2). Sides 2 and 3 have V-slotted bars 5 and 6 for holding wafers 7. Two wafers are placed back to back in each corresponding slot 8 of bars 4 and 5 with holder 1 in the open position. The holder is then closed and the weight of wafers 7 keeps holder 1 in a closed position in a cantilever fashion.