Browse Prior Art Database

Fabrication Process for Narrow Line Separation

IP.com Disclosure Number: IPCOM000087991D
Original Publication Date: 1977-Apr-01
Included in the Prior Art Database: 2005-Mar-03
Document File: 2 page(s) / 29K

Publishing Venue

IBM

Related People

Unis, RA: AUTHOR

Abstract

This article describes a process for producing geometries beyond the masking limits of photolithographic techniques. The invention is particularly directed toward the use of a gap formed in the course of off processing as a masking geometry for subsequent etching steps. The gap thus produced will have a width well below that obtainable in conventional masking.

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Fabrication Process for Narrow Line Separation

This article describes a process for producing geometries beyond the masking limits of photolithographic techniques. The invention is particularly directed toward the use of a gap formed in the course of off processing as a masking geometry for subsequent etching steps. The gap thus produced will have a width well below that obtainable in conventional masking.

The described process, carried out by the following steps, uses different materials such as gold and aluminum. Initially, a body of semiconductor material 10 having an aluminum coating 11 is coated with a photoresist material 12 over which is deposited a silicon layer 13. Using known photolithographic techniques, the silicon layer 13 is etched away leaving an opening 14 therein, which exposes the underlying photoresist material which is then exposed and developed in the normal manner. When the photoresist material underlying opening 14 is removed to expose the surface of the aluminum 11, the silicon material 13 is undercut and overhangs the remaining photoresist material by an amount depending upon the type and thickness of the photoresist used.

Once the surface of the aluminum 11 is exposed, a second material 16, having an etchant characteristic different from the aluminum, for example, gold, is deposited. Because this material is evaporated over the entire unit, an isolated section 16a is deposited in the gap 14 directly upon the exposed surface of the alumin...