Browse Prior Art Database

Automatic Positional Compensation due to Isotropic Etching in Quartz

IP.com Disclosure Number: IPCOM000088041D
Original Publication Date: 1977-Apr-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 2 page(s) / 40K

Publishing Venue

IBM

Related People

Gartner, HM: AUTHOR [+2]

Abstract

One of a plurality of mechanisms is shown for maintaining the original planar orientation of a plate 1, such as a quartz anode, relative to supporting structure 2. The mechanism comprises a compression spring 3, contained within a recess in the structure 2, that biases a locating pin 4 against the top wall 5 of a recess in the underside of the plate 1. The plurality of mechanisms automatically compensates for any change in the surface 6 of the plate 1 due to, for example, when the plate is quartz, being etched away in a chemical solution.

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Automatic Positional Compensation due to Isotropic Etching in Quartz

One of a plurality of mechanisms is shown for maintaining the original planar orientation of a plate 1, such as a quartz anode, relative to supporting structure 2. The mechanism comprises a compression spring 3, contained within a recess in the structure 2, that biases a locating pin 4 against the top wall 5 of a recess in the underside of the plate 1. The plurality of mechanisms automatically compensates for any change in the surface 6 of the plate 1 due to, for example, when the plate is quartz, being etched away in a chemical solution.

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