Browse Prior Art Database

Mask Holder

IP.com Disclosure Number: IPCOM000088042D
Original Publication Date: 1977-Apr-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 2 page(s) / 56K

Publishing Venue

IBM

Related People

Buechele, JW: AUTHOR [+2]

Abstract

In semiconductor manufacturing, a photolithographic mask must be protected against contamination, particularly in view of today's highly dense circuitry. Each added particle of contamination on a mask layer can significantly decrease yield.

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Mask Holder

In semiconductor manufacturing, a photolithographic mask must be protected against contamination, particularly in view of today's highly dense circuitry. Each added particle of contamination on a mask layer can significantly decrease yield.

Shown is a mask cartridge or carrier which provides significant control of contamination during storage. The features of the cartridge include use of masks without frames which can involve contamination due to mounting and cleaning procedure, clamping of the mask by a springloaded holder outside of the mask artwork area, the use of a special fixture tool (or transfer arm) to activate the cartridge and handling of the mask at an exposure tool.

Described is an operation of the tool for removing a mask positioned on a vacuum chuck of a work station. For this operation, the transfer arm (Fig. 1) can be brought into proximity to the mask with vacuum switched from the chuck to the vacuum ports on the transfer arm. The arm is then actuated for insertion into the cartridge with the arm cam engaged in the cam track of the cartridge cover to effect its opening. With the arm inserted in the cartridge, the vacuum is released to free and retain the mask in the cartridge on retraction of the arm. On arm retraction, the cam recedes along the cam track (Fig. 2) to effect closure of the cover with engagement of the holders against the mask to clamp it against the mask seat.

For vertical operation of the cartridge, an intermediary t...