Browse Prior Art Database

Preparing Smooth Substrates

IP.com Disclosure Number: IPCOM000088154D
Original Publication Date: 1977-Apr-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Thompson, WA: AUTHOR

Abstract

It is currently difficult to obtain smooth substrates where ultra-thin films (approx. less than 50 Angstroms) can be made continuous in large areas without defects such as steps and cracks.

This text was extracted from a PDF file.
This is the abbreviated version, containing approximately 100% of the total text.

Page 1 of 1

Preparing Smooth Substrates

It is currently difficult to obtain smooth substrates where ultra-thin films (approx. less than 50 Angstroms) can be made continuous in large areas without defects such as steps and cracks.

A method is described herein for the production of contaminant free, smooth, insulating, large area substrates.

Exemplary substrates used for ultra-thin films are silver deposited on cleaved mica which is of small area and useless for studying conducting films or thick float glass which is good for large areas. However, the latter substrate is readily scratched while handling and contamination buildup can lead to step structures.

To alleviate these difficulties, an in situ low temperature float glass process has been developed using silicone fluids. The fluid is degassed in an ultra high vacuum chamber at room temperature, and then large area substrates are prepared from this material by cooling and remelting, if necessary, through the glassy transition temperature at approximately 150 Degrees K. Since these substrates are prepared in an ultra high vacuum chamber, they are contaminant free, smooth, large area, insulating, and suitable for use in ultra thin film research at low temperature.

1