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Cold Cathode Sputtering Ion Source

IP.com Disclosure Number: IPCOM000088159D
Original Publication Date: 1977-Apr-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 2 page(s) / 58K

Publishing Venue

IBM

Related People

Penebre, N: AUTHOR

Abstract

The system incorporates the use of a built-in sputtering technique in a cold-cathode source.

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Cold Cathode Sputtering Ion Source

The system incorporates the use of a built-in sputtering technique in a cold- cathode source.

In a cold-cathode ion source, both cathodes are at ground potential in respect to the anode (Fig. 1). One cathode A has a hole in it for the purpose of extracting the ion beam.

Isolation of the other cathode B (Fig. 2) is by a feed-thru insulator and a -1 Kv potential applied to it.

The sputter efficiency obtained is greatly increased on this cathode. The material containing the element of interest to be sputtered is fastened to this cathode and sputtered off into the plasma, ionized and ejected into the beam. Some of the beams obtained in this fashion are Au, Cu, Pt and Fe.

If the material, such as salts and pellets, cannot be fashioned as part of the cathode, they may be loaded into a small steel mesh basket and bolted to the cathode (Fig. 3). Some of the beams obtained in this method are Li, Na and F.

The source can also be used as a conventional gas-fed device without any changes.

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