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Browse Prior Art Database

Facsimile Photoresist Test Mask

IP.com Disclosure Number: IPCOM000088214D
Original Publication Date: 1977-May-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 2 page(s) / 45K

Publishing Venue

IBM

Related People

Davis, CF: AUTHOR [+2]

Abstract

Mask 1 combines density step tablets and a pattern for concurrent evaluation of photoresist material including its contact to the mask, its exposure, and its developing process.

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Facsimile Photoresist Test Mask

Mask 1 combines density step tablets and a pattern for concurrent evaluation of photoresist material including its contact to the mask, its exposure, and its developing process.

Mask 1 has a facsimile pattern (not shown) of alternate opaque and transparent parallel lines or stripes on its contact surface, i.e., lower side. Each stripe has a predetermined width of, for example, .005 inch, simulating sizes of, for example, printed-circuit conductors. Attached to the noncontact upper surface are one or more identical, variable density step tablets 2, 3. Each tablet, which may be a photographic film strip, has several density images, increasing sequentially by a specified density increment. By way of example, there is shown 17 density images A0 - A16 for each of the tablets 2, 3, which are oriented in opposite directions.

A sample, e.g., Cu, workpiece 4 has its layer of photosensitive resist or other photosensitive material 5 placed in contact with the mask 1, and is exposed by an exposure machine or device (not shown) through mask 1 under controlled intensity and time conditions. After development, the test sample composite 4, 5 is evaluated for optimum exposure, photomaster-to-photoresist contact, photoresist sensitivity and developing characteristics, and the effects of the developing process.

The combined procedure enhances the diagnostic information available from either the step tablet or the striped pattern tests performed on se...