Browse Prior Art Database

Method of Cleaning Chemicals

IP.com Disclosure Number: IPCOM000088259D
Original Publication Date: 1977-May-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Hoffmeister, WW: AUTHOR [+2]

Abstract

The present method permits the production of ultrapure chemicals for use in semiconductor technology.

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This is the abbreviated version, containing approximately 100% of the total text.

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Method of Cleaning Chemicals

The present method permits the production of ultrapure chemicals for use in semiconductor technology.

It was found that when metal salt solutions are exposed to X-rays through HOSTAPHAN* foils an analytically determinable quantity of metal is deposited on the foil. A sufficiently long radiation produced a visible metal deposition. The deposited metal quantity can be determined by means of X-ray fluorescence spectroscopy.

In an embodiment, metal salt solutions of the elements gold, copper, and nickel at a concentration of 1 mg/ml were radiated for one hour in an X-ray facility in which several continuously advanceable HOSTAPHAN tapes were circularly arranged around the radiation source (cobalt 60) The element gold deposited very well, and the elements copper and nickel deposited sufficiently. Tests showed that the metal deposition yield increases as the concentration of the metal salt solution decreases. This renders the proposed method particularly suitable for cleaning further chemicals that have already been cleaned. * Trademark of Farbwerke Hoechst AG.

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