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Browse Prior Art Database

Air Slide Control Valves

IP.com Disclosure Number: IPCOM000088419D
Original Publication Date: 1977-Jun-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 3 page(s) / 80K

Publishing Venue

IBM

Related People

Hebert, RC: AUTHOR [+4]

Abstract

Fig. 1 illustrates a valve assembly for controlling the emission of low pressure air through directional orifices of an air track, such as shown in Fig. 2 and described on pages 3681-82 in the IBM Technical Disclosure Bulletin, Vol. 18, No. 11, April 1976. Also, the valve assembly of Fig. 1, when used in pairs, can be employed for controlling bidirectional air flow in air track systems shown in Fig. 3 and described on page 2340 in IBM Technical Disclosure Bulletin, Vol. 17, No. 8, January 1975. In addition (although not shown) the valves may be used to selectively control the flow of multidirectional air jets at intersections of air slides.

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Air Slide Control Valves

Fig. 1 illustrates a valve assembly for controlling the emission of low pressure air through directional orifices of an air track, such as shown in Fig. 2 and described on pages 3681-82 in the IBM Technical Disclosure Bulletin, Vol. 18, No. 11, April 1976. Also, the valve assembly of Fig. 1, when used in pairs, can be employed for controlling bidirectional air flow in air track systems shown in Fig. 3 and described on page 2340 in IBM Technical Disclosure Bulletin, Vol. 17, No. 8, January 1975. In addition (although not shown) the valves may be used to selectively control the flow of multidirectional air jets at intersections of air slides.

Referring to Fig. 1, normally all valves would be in the open condition (Fig. 1A). In this condition, the air entering the chamber beneath the louvre would be vented past the dump valve. The residual pressure measured at the directional louvres would be .5" water or less. This pressure is not high enough to alter the direction of travel of a substrate (e.g., semiconductor wafer) already in motion and will not interfere with a substrate approaching an intersection.

When it is desired to transport a substrate in a given direction from an intersection, high pressure (40 psi) air is applied to the side of the diaphragm opposite the valve. The high pressure air forces the spring on the valve to compress, sealing the chamber below the louvres from atmospheric dump. Clean plenum air then enters the chamber be...