Browse Prior Art Database

Workpiece Holder

IP.com Disclosure Number: IPCOM000088462D
Original Publication Date: 1977-Jun-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 2 page(s) / 49K

Publishing Venue

IBM

Related People

Bohlen, H: AUTHOR [+3]

Abstract

For processing a plate-shaped workpiece in a vacuum chamber by means of an electron (E) beam, the workpiece, to eliminate unevenness, must be pressed firmly onto a plane support. This is effected before the chamber is evacuated by using vacuum chucks with high forces of attraction. Then, by switching on an electric field, an electrostatic chuck becomes active, retaining the workpiece in the attracted position when the chamber is evacuated for processing the workpiece.

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Workpiece Holder

For processing a plate-shaped workpiece in a vacuum chamber by means of an electron (E) beam, the workpiece, to eliminate unevenness, must be pressed firmly onto a plane support. This is effected before the chamber is evacuated by using vacuum chucks with high forces of attraction. Then, by switching on an electric field, an electrostatic chuck becomes active, retaining the workpiece in the attracted position when the chamber is evacuated for processing the workpiece.

A plate-shaped workpiece 1, separated by an isolation layer 2, rests on a base plate 3 designed as a vacuum chuck and having a number of vertical channels 4. Channels 4 are connected to a vacuum pump via an inner chamber 5 and a valve 6. Base plate 3 is embedded in an isolation body 7 and can be connected to high voltage potential via a high-voltage line 8. The complete arrangement is located in a vacuum chamber 9 connectable to a vacuum pump via a valve 10.

Workpiece 1 to be processed is put on base plate 3 provided with isolation layer 2, and by opening valve 6, while vacuum chamber 9 is vented, workpiece 1, via inner chamber 5 and channels 4, is pulled firmly against base plate 3 and thus flattened out. Then high-voltage line 8 is switched on, so that workpiece 1 is retained in the fixed position of the resulting electric field when, by opening valve 10, vacuum chamber 9 is evacuated. The vacuum chuck function is then finished automatically.

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