Browse Prior Art Database

Photoresist Process Using Benzotriazole

IP.com Disclosure Number: IPCOM000088614D
Original Publication Date: 1977-Jul-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Cibulsky, MJ: AUTHOR [+4]

Abstract

Benzotriazole, when used with certain photoresist types for printedcircuit manufacture, provides certain advantages.

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Photoresist Process Using Benzotriazole

Benzotriazole, when used with certain photoresist types for printedcircuit manufacture, provides certain advantages.

For example, in a certain photoresist process using a KPR* bath, benzotriazole is added as a complexing, i.e., chelate, agent to the spent bath. It enhances the sensitivity of the bath and extends its useful life. A typical addition of benzotriazole to the KPR bath is approximately 0.10%. * Trademark of Eastman Kodak Company.

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