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Browse Prior Art Database

Photosensitive Dielectric Photoresist Process Using Benzotriazole

IP.com Disclosure Number: IPCOM000088615D
Original Publication Date: 1977-Jul-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Skarvinko, ER: AUTHOR

Abstract

Benzotriazole in printzd-circuit processes is finding many applications, as may be seen, for example, in the preceding article. The present process is another application in which benzotriazole is used as a sensitizer.

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Photosensitive Dielectric Photoresist Process Using Benzotriazole

Benzotriazole in printzd-circuit processes is finding many applications, as may be seen, for example, in the preceding article. The present process is another application in which benzotriazole is used as a sensitizer.

By way of background information, in certain photoresist processes using a light sensitive photoresist such as, for example, a photosensitive dielectric, tertiary butyl anthraquinone and carbon tetrabromide are used together as sensitizers. However, CBr(4) is costly and poisonous. In the present process, the CBr(4) is replaced by benzotriazole. The benzotriazole is incorporated into the photosensitive dielectric formulation in the range, for example, of 0.01% to
0.5%.

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