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Formation of Metals by Electron Beams or UV Light from Organic Acid Salt Resists

IP.com Disclosure Number: IPCOM000088945D
Original Publication Date: 1977-Aug-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 1 page(s) / 11K

Publishing Venue

IBM

Related People

Pacansky, J: AUTHOR

Abstract

A new approach to the construction of microcircuits is to have materials that produce copper upon exposure to electron beams. Very fine copper wires may be produced, thus completely bypassing lengthy and costly lithographic procedures.

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Formation of Metals by Electron Beams or UV Light from Organic Acid Salt Resists

A new approach to the construction of microcircuits is to have materials that produce copper upon exposure to electron beams. Very fine copper wires may be produced, thus completely bypassing lengthy and costly lithographic procedures.

When a metallic salt of an organic carboxylic acid is exposed to an electron beam or UV (ultraviolet) light, two electrons are transferred from the carboxylate anions to the metal in succession, leaving acyloxy radicals. Thereafter, the two very unstable radicals decompose and form gaseous products. In the case of copper formate, copper metal is deposited.

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