Browse Prior Art Database

Mask cleaning Technique Using Normal Shock

IP.com Disclosure Number: IPCOM000089056D
Original Publication Date: 1977-Sep-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 2 page(s) / 27K

Publishing Venue

IBM

Related People

Balder, WB: AUTHOR [+2]

Abstract

A semiconductor circuit printing mask 1 or other surface is cleaned of contamination by device 2 which has two concentric tubes 3 and 4. Outer tube 3 is connected to a source of purified air or nitrogen from which the static electrical charges were removed. Inner tube 4 is shaped to form a converging diverging nozzle 5, and is connected to a source of vacuum to remove the air or nitrogen and the contamination particles. The proper gap between device 2 and mask 1 is maintained by nylon rollers 6. The conditions of pressure, temperature and gap are established to produce a standing normal shock to aid in loosening particles from the mask surface.

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Mask cleaning Technique Using Normal Shock

A semiconductor circuit printing mask 1 or other surface is cleaned of contamination by device 2 which has two concentric tubes 3 and 4. Outer tube 3 is connected to a source of purified air or nitrogen from which the static electrical charges were removed. Inner tube 4 is shaped to form a converging diverging nozzle 5, and is connected to a source of vacuum to remove the air or nitrogen and the contamination particles. The proper gap between device 2 and mask 1 is maintained by nylon rollers 6. The conditions of pressure, temperature and gap are established to produce a standing normal shock to aid in loosening particles from the mask surface.

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