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Double Filament Electron Beam Evaporation Source

IP.com Disclosure Number: IPCOM000089240D
Original Publication Date: 1977-Oct-01
Included in the Prior Art Database: 2005-Mar-04
Document File: 2 page(s) / 41K

Publishing Venue

IBM

Related People

Dahlke, GP: AUTHOR [+4]

Abstract

This evaporation electron-beam gun is capable of depositing two thin films simultaneously or serially at near normal incidence to the substrates.

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Double Filament Electron Beam Evaporation Source

This evaporation electron-beam gun is capable of depositing two thin films simultaneously or serially at near normal incidence to the substrates.

Referring to the figure, evaporation chamber 1 contains a gun 12 which has disposed therein a two-filament electron gun (not shown) from which electrons are generated to a pair of crucibles 10A and 10B. The crucibles are disposed in side-by-side relationship, typically less than four inches apart in gun 12. Material evaporated from crucibles 10A and 10B is deposited on wafers located on a rotating cosine dome 2 at the upper part of the vacuum chamber.

Provision is made within the chamber to bleed-in water during the evaporation of certain of the thin films, for example, chrome. Valve 6 controls the bleed rate of water which is contained in bottle 5 and dispersed through an inlet tube 4.

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